A Course on “CHEMICAL VAPOR DEPOSITION”
( U of L Chemical Engineering)
M. Sunkara
Assistant Professor
Chemical Engineering
mahendra@louisville.edu
502-852-1558

Objectives:
· Understand the concepts involved in the deposition of thin and thick films using various Chemical Vapor Deposition (CVD) methods.
· Apply chemical kinetics (gas phase and gas-solid), thermodynamics and transport concepts to understand the chemical vapor deposition process.
· Understand the nucleation and growth aspects of the vapor grown crystalline and amorphous films


COURSE OUTLINE

Overall review of various CVD Systems and Vacuum Environments Thermodynamic principles involved with gas phase and gas-solid systems in CVD reactors

Lab 1: Equilibrium analysis of gas phase reactions and gas-solid reactions Chemical kinetics of gas phase and gas-solid reactions

Lab 2: Sensitivity and steady state analysis using CHEMKIN III

Lab 3: Reaction Rate Constant Evaluation Using Molecular Modeling (MSI Software) Chemistry of plasma systems

Lab 3: Modeling of plasma gas phase chemistry using CHEMKIN III & SAMPR Transport considerations in CVD reactors

Lab 4: Real case simulation of RFCVD (CCP & ICP) reactors (CFDRC Software) Thin and thick films science Stresses in Films Single crystal surfaces and Epitaxy Nucleation and Growth Texturing of polycrystalline films Role of defects during growth and on the film properties

Lab 5: Process – Morphology Experiment using Diamond CVD

Lab 6: Monte-Carlo Simulations – Multi-Scale Modeling for Growth and Etching

This course is presently being developed as part of a CAREER award from National Science Foundation.