E-Beam Lithography


LEO 1430 Scanning Electron Microscope (SEM). This electron microscope is fitted with a LaB6 filament and Nabbity e-beam steering system for electron beam lithography applications. It can fit 8 samples at a time on the sample stage that has 0-90 degrees tilt, 360 degrees of azimuth and ~10cm of lateral motion in the X and Y directions. The microscope has a secondary electron detector and a four-quadrant back scatter electron detector.