Our advanced synthesis facilities include 13 state-of-the-art deposition systems for the production of thin films, functional coatings and bulk nanomaterials. More specifically, the deposition techniques available are MOCVD for synthesis of free standing III-V films, and ternary III-V alloys, Microwave-Plasma CVD chambers for deposition of Silicon and Nanocrystalline diamond, Thermal and ECR Plasma CVD for nitridation and sulfurizations, Atomic Layer Deposition (ALD) of SiO2 and Al2O3, Hot-Filament CVD, 1 and 2-zone tube-furnace reactors for thermal oxidation, thermal evaporation chamber, Gold sputtering, atmospheric solvoplasma methods and downstream plasma system for bulk production of nanowires.