This is an 8’’ diameter, water-cooled double wall stainless steel reactor equipped with an electron cyclotron resonance (ECR) plasma source (ASTeX ® Model AX4500). It can generate high density, low pressure plasma which is suitable for plasma-enhanced chemical vapor deposition (PECVD). There are two different substrates stages, one is stationary with a Boroelectric™ heater which can heat the substrate up to 1100 oC, the other is a rotating substrates stage with rotating speed up to 2000rpm and a radiative heating set-up.