This is an ASTeX microwave plasma reactor used for a wide range of materials synthesis by CVD. The reactor is equipped with 1500 Watts MW power supply with deposition areas as high as 4 inch2. Using microwaves as the gas phase excitation source and different gas phase chemistries we were able to synthesize a variety of materials. A few of these include: Diamond thin films (doped and undoped), carbon microtubes, carbon nanopipettes and inorganic nanowires and nanowebs.