Gopinath Bhimarasetti,Ph.D
Technology Development group
Process Engineer
Intel Corporation
Portland
Phone: (502) 718 0846
Email:gopi@louisville.edu


I joined the CVD group in spring 2000 as a research assistant. Currently, I am a process engineer in the Technology Development group in Intel Corporation. I started out in the CVD group working on theoretical calculations of diamond gas phase chemistry and understanding the implications of dopant addition on the gas phase and on diamond deposition. Then I worked on multi-scale experimental studies to determine the root cause of defect formation on homo-epitaxially grown diamond surfaces. These studies were performed in collaboration with Dr. James Butler from Naval Research Laboratory. Based on these experimental studies, we determined that the polishing grooves, often not paid attention to, could be the main cause in the formation of spiral growth pattern often observed in diamond CVD. During this time, I also developed a process to synthesize a new class of carbon morphologies: Carbon Microtubes (CMTs). Using this process one can control the shape of the tube, diameter and the conical angles. I also developed a simple technique to synthesize ultrafine bismuth nanowires and a new morphology of bismuth: tapered whiskers. I also used computational fluid dynamics simulations to simulate flow patterns in a RF plasma CVD reactor. I also worked on upgrading our laboratory to a model CVD laboratory with all the required safety protocols.

With no doubt, the five years I spent in the lab are the most exciting and fruitful years of my life, both professionally and personally. Being in the CVD group helped me gain a very wide range of skills. I gained a lot of experience in theoretical calculations & simulations, in building reactors and doing experiments and in analyzing the samples using a whole array of materials characterization tools. This would not have possible without the support of my mentor Prof. Mahendra K. Sunkara.

Prof. Sunkara is the ideal mentor/advisor any new student can ever wish for. I feel very lucky to have such a vibrant, supportive, encouraging and cheerful mentor. When I joined the CVD group, I was like a baby who cannot take a step in research. It is my mentor who taught me how to walk and sprint the path. He is approachable at any time of the day for the minutest of details. He is very aware of every experiment that everyone in the in the lab does and is always available for discussion after every experiment. The feedback mechanism that every student goes through every day with him is simply amazing (considering that there are 10 students). Every student in his group will get his/her ‘hands and feet dirty’ on all the equipment available in the lab. He is never hesitant to let us try lot of new things. If we need more, he will figure out a way. For example, without his help I would not have had such fruitful collaborations with Dr. Butler from NRL and Prof. Cowley from ASU. We are always encouraged to attend and present in all the conferences both national and international.

The people in the CVD group are very supportive and discuss each others work. Everyone is aware of each others work and this makes the learning process very easy and enjoyable. The best part of CVD group: NO GROUP MEETINGS. When you are in the CVD group, you need any meeting to discuss, because it happens all the time without us knowing it. CVD lab and the people in the lab are my home away from home. This lab is never boring or monotonous. The time one spends will make them ready for their future work either in academia or industry. Being in the CVD lab made me a better person both professionally and personally.